Soft X-ray varied-line-spacing gratings fabricated by near-field holography using an electron beam lithography-written phase mask

Soft X-ray varied-line-spacing gratings fabricated by near-field holography using an electron beam lithography-written phase mask

open access.

Bibliographische Detailangaben
Veröffentlicht in:Journal of synchrotron radiation. - 1994. - 26(2019), Pt 5 vom: 01. Sept., Seite 1782-1789
1. Verfasser: Lin, Dakui (VerfasserIn)
Weitere Verfasser: Liu, Zhengkun, Dietrich, Kay, Sokolov, Andréy, Sertsu, Mewael Giday, Zhou, Hongjun, Huo, Tonglin, Kroker, Stefanie, Chen, Huoyao, Qiu, Keqiang, Xu, Xiangdong, Schäfers, Franz, Liu, Ying, Kley, Ernst Bernhard, Hong, Yilin
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2019
Zugriff auf das übergeordnete Werk:Journal of synchrotron radiation
Schlagworte:Journal Article electron beam lithography fabrication near-field holography soft X-ray varied-line-spacing grating spectrometer
Beschreibung
Zusammenfassung:open access.
A fabrication method comprising near-field holography (NFH) with an electron beam lithography (EBL)-written phase mask was developed to fabricate soft X-ray varied-line-spacing gratings (VLSGs). An EBL-written phase mask with an area of 52 mm × 30 mm and a central line density greater than 3000 lines mm-1 was used. The introduction of the EBL-written phase mask substantially simplified the NFH optics for pattern transfer. The characterization of the groove density distribution and diffraction efficiency of the fabricated VLSGs indicates that the EBL-NFH method is feasible and promising for achieving high-accuracy groove density distributions with corresponding image properties. Vertical stray light is suppressed in the soft X-ray spectral range
Beschreibung:Date Completed 10.09.2019
Date Revised 19.07.2024
published: Print-Electronic
Citation Status PubMed-not-MEDLINE
ISSN:1600-5775
DOI:10.1107/S1600577519008245