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231225s2018 xx |||||o 00| ||eng c |
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|a 10.1002/adma.201706995
|2 doi
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|a pubmed24n0936.xml
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|a (DE-627)NLM280898649
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|a (NLM)29430746
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|a DE-627
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|e rakwb
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|a eng
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|a Chang, Yuan-Ming
|e verfasserin
|4 aut
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|a Reversible and Precisely Controllable p/n-Type Doping of MoTe2 Transistors through Electrothermal Doping
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|c 2018
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
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|2 rdacarrier
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|a Date Completed 01.08.2018
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|a Date Revised 01.10.2020
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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|a Precisely controllable and reversible p/n-type electronic doping of molybdenum ditelluride (MoTe2 ) transistors is achieved by electrothermal doping (E-doping) processes. E-doping includes electrothermal annealing induced by an electric field in a vacuum chamber, which results in electron (n-type) doping and exposure to air, which induces hole (p-type) doping. The doping arises from the interaction between oxygen molecules or water vapor and defects of tellurium at the MoTe2 surface, and allows the accurate manipulation of p/n-type electrical doping of MoTe2 transistors. Because no dopant or special gas is used in the E-doping processes of MoTe2 , E-doping is a simple and efficient method. Moreover, through exact manipulation of p/n-type doping of MoTe2 transistors, quasi-complementary metal oxide semiconductor adaptive logic circuits, such as an inverter, not or gate, and not and gate, are successfully fabricated. The simple method, E-doping, adopted in obtaining p/n-type doping of MoTe2 transistors undoubtedly has provided an approach to create the electronic devices with desired performance
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|a Journal Article
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|a 2D electronics
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|a MoTe2
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|a doping
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|a logic circuits
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|a transition metal dichalcogenide
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|a Yang, Shih-Hsien
|e verfasserin
|4 aut
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|a Lin, Che-Yi
|e verfasserin
|4 aut
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|a Chen, Chang-Hung
|e verfasserin
|4 aut
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|a Lien, Chen-Hsin
|e verfasserin
|4 aut
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|a Jian, Wen-Bin
|e verfasserin
|4 aut
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|a Ueno, Keiji
|e verfasserin
|4 aut
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|a Suen, Yuen-Wuu
|e verfasserin
|4 aut
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|a Tsukagoshi, Kazuhito
|e verfasserin
|4 aut
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|a Lin, Yen-Fu
|e verfasserin
|4 aut
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 30(2018), 13 vom: 11. März, Seite e1706995
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnns
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|g volume:30
|g year:2018
|g number:13
|g day:11
|g month:03
|g pages:e1706995
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|u http://dx.doi.org/10.1002/adma.201706995
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