Complex High-Aspect-Ratio Metal Nanostructures by Secondary Sputtering Combined with Block Copolymer Self-Assembly

Complex High-Aspect-Ratio Metal Nanostructures by Secondary Sputtering Combined with Block Copolymer Self-Assembly

© 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Détails bibliographiques
Publié dans:Advanced materials (Deerfield Beach, Fla.). - 1998. - 28(2016), 38 vom: 04. Okt., Seite 8439-8445
Auteur principal: Jeon, Hwan-Jin (Auteur)
Autres auteurs: Kim, Ju Young, Jung, Woo-Bin, Jeong, Hyeon-Su, Kim, Yun Ho, Shin, Dong Ok, Jeong, Seong-Jun, Shin, Jonghwa, Kim, Sang Ouk, Jung, Hee-Tae
Format: Article en ligne
Langue:English
Publié: 2016
Accès à la collection:Advanced materials (Deerfield Beach, Fla.)
Sujets:Journal Article block copolymers high aspect ratio high resolution plasma reaction secondary sputtering
Description
Résumé:© 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
High-resolution (10 nm), high-areal density, high-aspect ratio (>5), and morphologically complex nanopatterns are fabricated from a single conventional block copolymer (BCP) structure with a 70 nm scale resolution and an aspect ratio of 1, through the secondary-sputtering phenomenon during the Ar-ion-bombardment process. This approach provides a foundation for the design of new routes to BCP lithography
Description:Date Completed 17.07.2018
Date Revised 01.10.2020
published: Print-Electronic
Citation Status PubMed-not-MEDLINE
ISSN:1521-4095
DOI:10.1002/adma.201602523