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231224s2016 xx |||||o 00| ||eng c |
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|a 10.1002/adma.201504590
|2 doi
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|a pubmed25n0851.xml
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|a eng
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| 100 |
1 |
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|a Kim, Ju Young
|e verfasserin
|4 aut
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| 245 |
1 |
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|a 3D Tailored Crumpling of Block-Copolymer Lithography on Chemically Modified Graphene
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|c 2016
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|a Text
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|a ƒaComputermedien
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|a Date Completed 17.06.2016
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|a Date Revised 01.10.2020
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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|a Novel 3D self-assembled nanopatterning is presented via tailored crumpling of chemically modified graphene. Block-copolymer self-assembly formed on a layer of chemically modified graphene provides highly dense and uniform 2D nanopatterns, and the controlled crumpling of the chemically modified graphene by mechanical instabilities realizes the controlled 3D transformation of the self-assembled nanopatterns
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|a Journal Article
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|a 3D
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|a block copolymers
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|a grapheme
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|a instability
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|a self-assembly
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| 700 |
1 |
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|a Lim, Joonwon
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Jin, Hyeong Min
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Kim, Bong Hoon
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Jeong, Seong-Jun
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Choi, Dong Sung
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Li, Dong Jun
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Kim, Sang Ouk
|e verfasserin
|4 aut
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| 773 |
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 28(2016), 8 vom: 24. Feb., Seite 1591-6
|w (DE-627)NLM098206397
|x 1521-4095
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| 773 |
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|g volume:28
|g year:2016
|g number:8
|g day:24
|g month:02
|g pages:1591-6
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|u http://dx.doi.org/10.1002/adma.201504590
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