3D Tailored Crumpling of Block-Copolymer Lithography on Chemically Modified Graphene

3D Tailored Crumpling of Block-Copolymer Lithography on Chemically Modified Graphene

© 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 28(2016), 8 vom: 24. Feb., Seite 1591-6
1. Verfasser: Kim, Ju Young (VerfasserIn)
Weitere Verfasser: Lim, Joonwon, Jin, Hyeong Min, Kim, Bong Hoon, Jeong, Seong-Jun, Choi, Dong Sung, Li, Dong Jun, Kim, Sang Ouk
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2016
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article 3D block copolymers grapheme instability self-assembly
Beschreibung
Zusammenfassung:© 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Novel 3D self-assembled nanopatterning is presented via tailored crumpling of chemically modified graphene. Block-copolymer self-assembly formed on a layer of chemically modified graphene provides highly dense and uniform 2D nanopatterns, and the controlled crumpling of the chemically modified graphene by mechanical instabilities realizes the controlled 3D transformation of the self-assembled nanopatterns
Beschreibung:Date Completed 17.06.2016
Date Revised 01.10.2020
published: Print-Electronic
Citation Status PubMed-not-MEDLINE
ISSN:1521-4095
DOI:10.1002/adma.201504590