APA Zitierstil

Kim, J. Y., Lim, J., Jin, H. M., Kim, B. H., Jeong, S., Choi, D. S., . . . Kim, S. O. (2016). 3D Tailored Crumpling of Block-Copolymer Lithography on Chemically Modified Graphene. Advanced materials (Deerfield Beach, Fla.), 28(8), 1591. https://doi.org/10.1002/adma.201504590

Chicago Zitierstil

Kim, Ju Young, Joonwon Lim, Hyeong Min Jin, Bong Hoon Kim, Seong-Jun Jeong, Dong Sung Choi, Dong Jun Li, und Sang Ouk Kim. "3D Tailored Crumpling of Block-Copolymer Lithography on Chemically Modified Graphene." Advanced Materials (Deerfield Beach, Fla.) 28, no. 8 (2016): 1591. https://dx.doi.org/10.1002/adma.201504590.

MLA Zitierstil

Kim, Ju Young, et al. "3D Tailored Crumpling of Block-Copolymer Lithography on Chemically Modified Graphene." Advanced Materials (Deerfield Beach, Fla.), vol. 28, no. 8, 2016, p. 1591.