Characterization of dislocations in germanium layers grown on (011)- and (111)-oriented silicon by coplanar and noncoplanar X-ray diffraction
Strained germanium grown on silicon with nonstandard surface orientations like (011) or (111) is a promising material for various semiconductor applications, for example complementary metal-oxide semiconductor transistors. However, because of the large mismatch between the lattice constants of silic...
| Publié dans: | Journal of applied crystallography. - 1998. - 48(2015), Pt 3 vom: 01. Juni, Seite 655-665 |
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| Auteur principal: | |
| Autres auteurs: | , , , |
| Format: | Article |
| Langue: | English |
| Publié: |
2015
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| Accès à la collection: | Journal of applied crystallography |
| Sujets: | Journal Article complementary metal-oxide semiconductors noncoplanar X-ray diffraction silicon strained germanium |