Characterization of dislocations in germanium layers grown on (011)- and (111)-oriented silicon by coplanar and noncoplanar X-ray diffraction

von Benediktovitch, Andrei
Veröffentlicht in: Journal of applied crystallography (2015)

Ab initio simulation of diffractometer instrumental function for high-resolution X-ray diffraction

von Mikhalychev, Alexander
Veröffentlicht in: Journal of applied crystallography (2015)

Characterization of SiGe thin films using a laboratory X-ray instrument

von Ulyanenkova, Tatjana
Veröffentlicht in: Journal of applied crystallography (2013)