Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template

Bibliographische Detailangaben
Veröffentlicht in:	Advanced materials (Deerfield Beach, Fla.). - 1998. - 27(2015), 29 vom: 05. Aug., Seite 4364-70
1. Verfasser:	Sun, Zhiwei (VerfasserIn)
Weitere Verfasser:	Chen, Zhenbin, Zhang, Wenxu, Choi, Jaewon, Huang, Caili, Jeong, Gajin, Coughlin, E Bryan, Hsu, Yautzong, Yang, XiaoMin, Lee, Kim Y, Kuo, David S, Xiao, Shuaigang, Russell, Thomas P
Format:	Online-Aufsatz
Sprache:	English
Veröffentlicht:	2015
Zugriff auf das übergeordnete Werk:	Advanced materials (Deerfield Beach, Fla.)
Schlagworte:	Journal Article directed self-assembly lamellar block copolymers nanoimprint photoresist templates salt complexes solvent vapor annealing


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100	1		\|a Sun, Zhiwei \|e verfasserin \|4 aut
245	1	0	\|a Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template
264		1	\|c 2015
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337			\|a ƒaComputermedien \|b c \|2 rdamedia
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500			\|a Date Completed 14.10.2015
500			\|a Date Revised 30.09.2020
500			\|a published: Print-Electronic
500			\|a Citation Status PubMed-not-MEDLINE
520			\|a © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
520			\|a Low molecular weight P2VP-b-PS-b-P2VP triblock copolymer (poly(2-vinlypyridine)-block-polystyrene-block-poly(2-vinylpyridine)] is doped with copper chloride and microphase separated into lamellar line patterns with ultrahigh area density. Salt-doped P2VP-b-PS-b-P2VP triblock copolymer is self-assembled on the top of the nanoimprinted photoresist template, and metallic nanowires with long-range ordering are prepared with platinum-salt infiltration and plasma etching
650		4	\|a Journal Article
650		4	\|a directed self-assembly
650		4	\|a lamellar block copolymers
650		4	\|a nanoimprint photoresist templates
650		4	\|a salt complexes
650		4	\|a solvent vapor annealing
700	1		\|a Chen, Zhenbin \|e verfasserin \|4 aut
700	1		\|a Zhang, Wenxu \|e verfasserin \|4 aut
700	1		\|a Choi, Jaewon \|e verfasserin \|4 aut
700	1		\|a Huang, Caili \|e verfasserin \|4 aut
700	1		\|a Jeong, Gajin \|e verfasserin \|4 aut
700	1		\|a Coughlin, E Bryan \|e verfasserin \|4 aut
700	1		\|a Hsu, Yautzong \|e verfasserin \|4 aut
700	1		\|a Yang, XiaoMin \|e verfasserin \|4 aut
700	1		\|a Lee, Kim Y \|e verfasserin \|4 aut
700	1		\|a Kuo, David S \|e verfasserin \|4 aut
700	1		\|a Xiao, Shuaigang \|e verfasserin \|4 aut
700	1		\|a Russell, Thomas P \|e verfasserin \|4 aut
773	0	8	\|i Enthalten in \|t Advanced materials (Deerfield Beach, Fla.) \|d 1998 \|g 27(2015), 29 vom: 05. Aug., Seite 4364-70 \|w (DE-627)NLM098206397 \|x 1521-4095 \|7 nnns
773	1	8	\|g volume:27 \|g year:2015 \|g number:29 \|g day:05 \|g month:08 \|g pages:4364-70
856	4	0	\|u http://dx.doi.org/10.1002/adma.201501585 \|3 Volltext
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