Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Temp...

von Sun, Zhiwei
Veröffentlicht in: Advanced materials (Deerfield Beach, Fla.) (2015)