Combinatorial optimization of a molecular glass photoresist system for electron beam lithography
Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
| Publié dans: | Advanced materials (Deerfield Beach, Fla.). - 1998. - 23(2011), 45 vom: 01. Dez., Seite 5404-8 |
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| Auteur principal: | |
| Autres auteurs: | , , |
| Format: | Article en ligne |
| Langue: | English |
| Publié: |
2011
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| Accès à la collection: | Advanced materials (Deerfield Beach, Fla.) |
| Sujets: | Journal Article Research Support, Non-U.S. Gov't Alkynes Imidazoles Sulfonic Acids Phenol 339NCG44TV glycoluril U9H2W4OS13 |
| Résumé: | Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. Electron beam lithography is a powerful technique for the production of nanostructures but pattern quality depends on numerous interacting process variables. Orthogonal gradients of resist composition, baking temperatures, and development time as well as dose variations inside writing fields are used to prepare ternary combinatorial libraries for an efficient stepwise optimization of a molecular glass negative tone resist system |
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| Description: | Date Completed 16.03.2012 Date Revised 30.09.2020 published: Print-Electronic Citation Status MEDLINE |
| ISSN: | 1521-4095 |
| DOI: | 10.1002/adma.201103107 |