Combinatorial optimization of a molecular glass photoresist system for electron beam lithography

Combinatorial optimization of a molecular glass photoresist system for electron beam lithography

Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 23(2011), 45 vom: 01. Dez., Seite 5404-8
1. Verfasser: Bauer, Wolfgang-Andreas C (VerfasserIn)
Weitere Verfasser: Neuber, Christian, Ober, Christopher K, Schmidt, Hans-Werner
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2011
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article Research Support, Non-U.S. Gov't Alkynes Imidazoles Sulfonic Acids Phenol 339NCG44TV glycoluril U9H2W4OS13
Beschreibung
Zusammenfassung:Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Electron beam lithography is a powerful technique for the production of nanostructures but pattern quality depends on numerous interacting process variables. Orthogonal gradients of resist composition, baking temperatures, and development time as well as dose variations inside writing fields are used to prepare ternary combinatorial libraries for an efficient stepwise optimization of a molecular glass negative tone resist system
Beschreibung:Date Completed 16.03.2012
Date Revised 30.09.2020
published: Print-Electronic
Citation Status MEDLINE
ISSN:1521-4095
DOI:10.1002/adma.201103107