APA Zitierstil

Bauer, W. C., Neuber, C., Ober, C. K., & Schmidt, H. (2011). Combinatorial optimization of a molecular glass photoresist system for electron beam lithography. Advanced materials (Deerfield Beach, Fla.), 23(45), 5404. https://doi.org/10.1002/adma.201103107

Chicago Zitierstil

Bauer, Wolfgang-Andreas C., Christian Neuber, Christopher K. Ober, und Hans-Werner Schmidt. "Combinatorial Optimization of a Molecular Glass Photoresist System for Electron Beam Lithography." Advanced Materials (Deerfield Beach, Fla.) 23, no. 45 (2011): 5404. https://dx.doi.org/10.1002/adma.201103107.

MLA Zitierstil

Bauer, Wolfgang-Andreas C., et al. "Combinatorial Optimization of a Molecular Glass Photoresist System for Electron Beam Lithography." Advanced Materials (Deerfield Beach, Fla.), vol. 23, no. 45, 2011, p. 5404.