In situ quadrupole mass spectrometry study of atomic-layer deposition of ZrO2 using Cp2Zr(CH3)2 and water

In situ quadrupole mass spectrometry study of atomic-layer deposition of ZrO2 using Cp2Zr(CH3)2 and water

Reactions during the atomic layer deposition (ALD) process of ZrO(2) from Cp(2)Zr(CH(3))(2) and deuterated water as precursors were studied with a quadrupole mass spectrometer (QMS) at 210-440 degrees C. The detected reaction byproducts were CpD (m/z = 67) and CH(3)D (m/z = 17). Almost all (90%) of...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1999. - 21(2005), 16 vom: 02. Aug., Seite 7321-5
1. Verfasser: Niinistö, Jaakko (VerfasserIn)
Weitere Verfasser: Rahtu, Antti, Putkonen, Matti, Ritala, Mikko, Leskelä, Markku, Niinistö, Lauri
Format: Aufsatz
Sprache:English
Veröffentlicht: 2005
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article