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231223s2005 xx ||||| 00| ||eng c |
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|a (NLM)15807594
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|a DE-627
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|c DE-627
|e rakwb
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|a eng
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| 100 |
1 |
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|a Matero, Raija
|e verfasserin
|4 aut
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|a In situ reaction mechanism studies on the atomic layer deposition of Al2O3 from (CH3)2AlCl and water
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|c 2005
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|a Text
|b txt
|2 rdacontent
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|a ohne Hilfsmittel zu benutzen
|b n
|2 rdamedia
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|a Band
|b nc
|2 rdacarrier
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|a Date Completed 08.08.2006
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|a Date Revised 05.04.2005
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|a published: Print
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|a Citation Status PubMed-not-MEDLINE
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|a Reaction mechanisms between dimethylaluminum chloride and deuterated water in the atomic layer deposition (ALD) of Al2O3 were studied at 150-400 degrees C using a quartz crystal microbalance (QCM) and a quadrupole mass spectrometer (QMS). The observed reaction byproducts were DCl and CH3D. QMS showed that about one-third of the chlorine, and half of the methyl ligands were released during the (CH3)2AlCl pulse. The growth rate deduced from the QMS and QCM data was in qualitative agreement with the previously published growth rate from ALD film growth experiments
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|a Journal Article
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|a Rahtu, Antti
|e verfasserin
|4 aut
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|a Ritala, Mikko
|e verfasserin
|4 aut
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| 773 |
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8 |
|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1999
|g 21(2005), 8 vom: 12. Apr., Seite 3498-502
|w (DE-627)NLM098181009
|x 1520-5827
|7 nnns
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| 773 |
1 |
8 |
|g volume:21
|g year:2005
|g number:8
|g day:12
|g month:04
|g pages:3498-502
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|a AR
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| 952 |
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|d 21
|j 2005
|e 8
|b 12
|c 04
|h 3498-502
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