In situ reaction mechanism studies on the atomic layer deposition of Al2O3 from (CH3)2AlCl and water
Reaction mechanisms between dimethylaluminum chloride and deuterated water in the atomic layer deposition (ALD) of Al2O3 were studied at 150-400 degrees C using a quartz crystal microbalance (QCM) and a quadrupole mass spectrometer (QMS). The observed reaction byproducts were DCl and CH3D. QMS showe...
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1999. - 21(2005), 8 vom: 12. Apr., Seite 3498-502 |
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| Format: | Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
2005
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids |
| Schlagworte: | Journal Article |
| Zusammenfassung: | Reaction mechanisms between dimethylaluminum chloride and deuterated water in the atomic layer deposition (ALD) of Al2O3 were studied at 150-400 degrees C using a quartz crystal microbalance (QCM) and a quadrupole mass spectrometer (QMS). The observed reaction byproducts were DCl and CH3D. QMS showed that about one-third of the chlorine, and half of the methyl ligands were released during the (CH3)2AlCl pulse. The growth rate deduced from the QMS and QCM data was in qualitative agreement with the previously published growth rate from ALD film growth experiments |
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| Beschreibung: | Date Completed 08.08.2006 Date Revised 05.04.2005 published: Print Citation Status PubMed-not-MEDLINE |
| ISSN: | 1520-5827 |