In situ reaction mechanism studies on the atomic layer deposition of Al2O3 from (CH3)2AlCl and water
Reaction mechanisms between dimethylaluminum chloride and deuterated water in the atomic layer deposition (ALD) of Al2O3 were studied at 150-400 degrees C using a quartz crystal microbalance (QCM) and a quadrupole mass spectrometer (QMS). The observed reaction byproducts were DCl and CH3D. QMS showe...
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1999. - 21(2005), 8 vom: 12. Apr., Seite 3498-502 |
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| Format: | Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
2005
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids |
| Schlagworte: | Journal Article |