Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100 °C through Control of Plasma Chemistry

von Mattinen, Miika
Veröffentlicht in: Chemistry of materials : a publication of the American Chemical Society (2022)

Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2

von Arts, Karsten
Veröffentlicht in: Chemistry of materials : a publication of the American Chemical Society (2021)

Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution

von Balasubramanyam, Shashank
Veröffentlicht in: Chemistry of materials : a publication of the American Chemical Society (2019)

From the Bottom-Up Toward Area-Selective Atomic Layer Deposition with High Selectivity

von Mackus, Adriaan J M
Veröffentlicht in: Chemistry of materials : a publication of the American Chemical Society (2019)

Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition

von Basuvalingam, Saravana Balaji
Veröffentlicht in: Chemistry of materials : a publication of the American Chemical Society (2019)

Dopant Distribution in Atomic Layer Deposited ZnO:Al Films Visualized by Transmission Electron Microscopy and Atom Probe Tomography

von Wu, Yizhi
Veröffentlicht in: Chemistry of materials : a publication of the American Chemical Society (2018)

Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation

von Singh, Joseph A
Veröffentlicht in: Chemistry of materials : a publication of the American Chemical Society (2018)

Area-Selective Atomic Layer Deposition of In2O3:H Using a μ-Plasma Printer for Local Area Activation

von Mameli, Alfredo
Veröffentlicht in: Chemistry of materials : a publication of the American Chemical Society (2017)