Enhanced Synaptic Memory Window and Linearity in Planar In2Se3 Ferroelectric Junctions

© 2024 Wiley‐VCH GmbH.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - (2024) vom: 20. Dez., Seite e2413178
1. Verfasser: Jeon, Yu-Rim (VerfasserIn)
Weitere Verfasser: Kim, Dongyoon, Biswas, Chandan, Ignacio, Nicholas D, Carmichael, Patrick, Feng, Shaopeng, Lai, Keji, Kim, Dong-Hwan, Akinwande, Deji
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2024
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article 2D vdW material CNN MNIST ferroelectric tunneling junction neuromorphic computing system synaptic device α‐In2Se3
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520 |a A synaptic memristor using 2D ferroelectric junctions is a promising candidate for future neuromorphic computing with ultra-low power consumption, parallel computing, and adaptive scalable computing technologies. However, its utilization is restricted due to the limited operational voltage memory window and low on/off current (ION/OFF) ratio of the memristor devices. Here, it is demonstrated that synaptic operations of 2D In2Se3 ferroelectric junctions in a planar memristor architecture can reach a voltage memory window as high as 16 V (±8 V) and ION/OFF ratio of 108, significantly higher than the current literature values. The power consumption is 10-5 W at the on state, demonstrating low power usage while maintaining a large ION/OFF ratio of 108 compared to other ferroelectric devices. Moreover, the developed ferroelectric junction mimicked synaptic plasticity through pulses in the pre-synapse. The nonlinearity factors are obtained 1.25 for LTP, -0.25 for LTD, respectively. The single-layer perceptron (SLP) and convolutional neural network (CNN) on-chip training results in an accuracy of up to 90%, compared to the 91% in an ideal synapse device. Furthermore, the incorporation of a 3 nm thick SiO2 interface between the α-In2Se3 and the Au electrode resulted in ultrahigh performance among other 2D ferroelectric junction devices to date 
650 4 |a Journal Article 
650 4 |a 2D vdW material 
650 4 |a CNN 
650 4 |a MNIST 
650 4 |a ferroelectric tunneling junction 
650 4 |a neuromorphic computing system 
650 4 |a synaptic device 
650 4 |a α‐In2Se3 
700 1 |a Kim, Dongyoon  |e verfasserin  |4 aut 
700 1 |a Biswas, Chandan  |e verfasserin  |4 aut 
700 1 |a Ignacio, Nicholas D  |e verfasserin  |4 aut 
700 1 |a Carmichael, Patrick  |e verfasserin  |4 aut 
700 1 |a Feng, Shaopeng  |e verfasserin  |4 aut 
700 1 |a Lai, Keji  |e verfasserin  |4 aut 
700 1 |a Kim, Dong-Hwan  |e verfasserin  |4 aut 
700 1 |a Akinwande, Deji  |e verfasserin  |4 aut 
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773 1 8 |g year:2024  |g day:20  |g month:12  |g pages:e2413178 
856 4 0 |u http://dx.doi.org/10.1002/adma.202413178  |3 Volltext 
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