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|a 10.1002/adma.202403783
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|a pubmed24n1538.xml
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|a DE-627
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|a eng
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|a Ok, Jong Mok
|e verfasserin
|4 aut
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|a Hole-Carrier-Dominant Transport in 2D Single-Crystal Copper
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|c 2024
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
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|a Date Revised 18.09.2024
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2024 The Author(s). Advanced Materials published by Wiley‐VCH GmbH.
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|a In 2D noble metals like copper, the carrier scattering at grain boundaries has obscured the intrinsic nature of electronic transport. However, it is demonstrated that the intrinsic nature of transport by hole carriers in 2D copper can be revealed by growing thin films without grain boundaries. As even a slight deviation from the twin boundary is perceived as grain boundaries by electrons, it is only through the thorough elimination of grain boundaries that the hidden hole-like attribute of 2D single-crystal copper can be unmasked. Two types of Fermi surfaces, a large hexagonal Fermi surface centered at the zone center and the triangular Fermi surface around the zone corner, tightly matching to the calculated Fermi surface topology, confirmed by angle-resolved photoemission spectroscopy (ARPES) measurements and vivid nonlinear Hall effects of the 2D single-crystal copper account for the presence of hole carriers experimentally. This breakthrough suggests the potential to manipulate the majority carrier polarity in metals by means of grain boundary engineering in a 2D geometry
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|a Journal Article
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|a grain boundary free
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|a hole carriers in Cu
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|a nonlinear Hall effect
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|a single‐crystal copper thin film
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|a triangular hole orbit
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|a Kang, Kyungrok
|e verfasserin
|4 aut
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|a Hyun, Jounghoon
|e verfasserin
|4 aut
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|a Lim, Chan-Young
|e verfasserin
|4 aut
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|a Gim, Seonggeon
|e verfasserin
|4 aut
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|a Hwang, Jinwoong
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|4 aut
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|a Denlinger, Jonathan D
|e verfasserin
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|a Cheon, Miyeon
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|a Regmi, Binod
|e verfasserin
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|a Lee, Ji-Eun
|e verfasserin
|4 aut
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|a Ryu, Hyejin
|e verfasserin
|4 aut
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|a Kim, Su Jae
|e verfasserin
|4 aut
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|a Lee, Yousil
|e verfasserin
|4 aut
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|a Kim, Young-Hoon
|e verfasserin
|4 aut
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|a Kim, Young-Min
|e verfasserin
|4 aut
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|a Kim, Yeongkwan
|e verfasserin
|4 aut
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|a Kim, Seong-Gon
|e verfasserin
|4 aut
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|a Yang, Heejun
|e verfasserin
|4 aut
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|a Jeong, Se-Young
|e verfasserin
|4 aut
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 36(2024), 36 vom: 18. Sept., Seite e2403783
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnns
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|g volume:36
|g year:2024
|g number:36
|g day:18
|g month:09
|g pages:e2403783
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|u http://dx.doi.org/10.1002/adma.202403783
|3 Volltext
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