Anti-adsorption Mechanism of Photoresist by Pluronic Surfactants : An Insight into Their Adsorbed Structure
Photoresist stripping is the final step in the photolithography process that forms fine patterns for electronic devices. Recently, a mixture of ethylene carbonate (EC) and propylene carbonate (PC) has attracted attention as a new stripper based on its eco-friendliness and anti-corrosiveness. However...
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Bibliographische Detailangaben
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 39(2023), 22 vom: 06. Juni, Seite 7876-7883
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| 1. Verfasser: |
Hanzawa, Masaki
(VerfasserIn) |
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| Weitere Verfasser: |
Ogura, Taku,
Tsuchiya, Koji,
Akamatsu, Masaaki,
Sakai, Kenichi,
Sakai, Hideki |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2023
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
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| Schlagworte: | Journal Article |
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