Oxidation Mechanisms of Hafnium Overlayers Deposited on an Si(111) Substrate
The oxidation mechanism of hafnium overlayers on an Si(111) substrate [Hf-Si(111), including the outermost metallic Hf overlayers and interfacial Hf silicides (HfSi and HfSi4)] was investigated via high-resolution synchrotron radiation X-ray photoelectron spectroscopy (SR-XPS) of Hf 4f5/2,7/2, Si 2p...
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Détails bibliographiques
| Publié dans: | Langmuir : the ACS journal of surfaces and colloids. - 1985. - 38(2022), 8 vom: 01. März, Seite 2642-2650
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| Auteur principal: |
Kakiuchi, Takuhiro
(Auteur) |
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| Autres auteurs: |
Matoba, Tomoki,
Koyama, Daisuke,
Yamamoto, Yuki,
Yoshigoe, Akitaka |
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| Format: | Article en ligne
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| Langue: | English |
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| Publié: |
2022
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| Accès à la collection: | Langmuir : the ACS journal of surfaces and colloids
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| Sujets: | Journal Article |
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