Gate-Coupling-Enabled Robust Hysteresis for Nonvolatile Memory and Programmable Rectifier in Van der Waals Ferroelectric Heterojunctions

© 2020 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 32(2020), 14 vom: 16. Apr., Seite e1908040
1. Verfasser: Huang, Wenhao (VerfasserIn)
Weitere Verfasser: Wang, Feng, Yin, Lei, Cheng, Ruiqing, Wang, Zhenxing, Sendeku, Marshet Getaye, Wang, Junjun, Li, Ningning, Yao, Yuyu, He, Jun
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2020
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article 2D ferroelectrics dual-gated coupling nonvolatile memory programmable rectifiers van der Waals heterostructures
LEADER 01000naa a22002652 4500
001 NLM306745607
003 DE-627
005 20231225124041.0
007 cr uuu---uuuuu
008 231225s2020 xx |||||o 00| ||eng c
024 7 |a 10.1002/adma.201908040  |2 doi 
028 5 2 |a pubmed24n1022.xml 
035 |a (DE-627)NLM306745607 
035 |a (NLM)32080924 
040 |a DE-627  |b ger  |c DE-627  |e rakwb 
041 |a eng 
100 1 |a Huang, Wenhao  |e verfasserin  |4 aut 
245 1 0 |a Gate-Coupling-Enabled Robust Hysteresis for Nonvolatile Memory and Programmable Rectifier in Van der Waals Ferroelectric Heterojunctions 
264 1 |c 2020 
336 |a Text  |b txt  |2 rdacontent 
337 |a ƒaComputermedien  |b c  |2 rdamedia 
338 |a ƒa Online-Ressource  |b cr  |2 rdacarrier 
500 |a Date Revised 30.09.2020 
500 |a published: Print-Electronic 
500 |a Citation Status PubMed-not-MEDLINE 
520 |a © 2020 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. 
520 |a Ferroelectric field-effect transistors (FeFETs) are one of the most interesting ferroelectric devices; however, they, usually suffer from low interface quality. The recently discovered 2D layered ferroelectric materials, combining with the advantages of van der Waals heterostructures (vdWHs), may be promising to fabricate high-quality FeFETs with atomically thin thickness. Here, dual-gated 2D ferroelectric vdWHs are constructed using MoS2 , hexagonal boron nitride (h-BN), and CuInP2 S6 (CIPS), which act as a high-performance nonvolatile memory and programmable rectifier. It is first noted that the insertion of h-BN and dual-gated coupling device configuration can significantly stabilize and effectively polarize ferroelectric CIPS. Through this design, the device shows a record-high performance with a large memory window, large on/off ratio (107 ), ultralow programming state current (10-13 A), and long-time endurance (104 s) as nonvolatile memory. As for programmable rectifier, a wide range of gate-tunable rectification behavior is observed. Moreover, the device exhibits a large rectification ratio (3 × 105 ) with stable retention under the programming state. This demonstrates the promising potential of ferroelectric vdWHs for new multifunctional ferroelectric devices 
650 4 |a Journal Article 
650 4 |a 2D ferroelectrics 
650 4 |a dual-gated coupling 
650 4 |a nonvolatile memory 
650 4 |a programmable rectifiers 
650 4 |a van der Waals heterostructures 
700 1 |a Wang, Feng  |e verfasserin  |4 aut 
700 1 |a Yin, Lei  |e verfasserin  |4 aut 
700 1 |a Cheng, Ruiqing  |e verfasserin  |4 aut 
700 1 |a Wang, Zhenxing  |e verfasserin  |4 aut 
700 1 |a Sendeku, Marshet Getaye  |e verfasserin  |4 aut 
700 1 |a Wang, Junjun  |e verfasserin  |4 aut 
700 1 |a Li, Ningning  |e verfasserin  |4 aut 
700 1 |a Yao, Yuyu  |e verfasserin  |4 aut 
700 1 |a He, Jun  |e verfasserin  |4 aut 
773 0 8 |i Enthalten in  |t Advanced materials (Deerfield Beach, Fla.)  |d 1998  |g 32(2020), 14 vom: 16. Apr., Seite e1908040  |w (DE-627)NLM098206397  |x 1521-4095  |7 nnns 
773 1 8 |g volume:32  |g year:2020  |g number:14  |g day:16  |g month:04  |g pages:e1908040 
856 4 0 |u http://dx.doi.org/10.1002/adma.201908040  |3 Volltext 
912 |a GBV_USEFLAG_A 
912 |a SYSFLAG_A 
912 |a GBV_NLM 
912 |a GBV_ILN_350 
951 |a AR 
952 |d 32  |j 2020  |e 14  |b 16  |c 04  |h e1908040