Self-Templating Approaches to Hollow Nanostructures

© 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 31(2019), 38 vom: 15. Sept., Seite e1802349
1. Verfasser: Feng, Ji (VerfasserIn)
Weitere Verfasser: Yin, Yadong
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2019
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article Review Ostwald ripening dissolution-regrowth galvanic replacements hollow nanostructures self-templating surface-protected hollowing process the Kirkendall effect
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520 |a This current research progress on the fabrication of hollow nanostructures by using self-templating methods is reviewed. After a brief introduction to the unique properties and applications of hollow nanostructures and the three general fabrication routes, the discussions are focused on the five main self-templating strategies, including galvanic replacement, the Kirkendall effect, Ostwald ripening, dissolution-regrowth, and the surface-protected hollowing process. Some newly developed synthetic routes are selected and discussed in detail. In conclusion, a summary and the perspectives on the directions that might lead the future development of this exciting field are presented 
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650 4 |a Ostwald ripening 
650 4 |a dissolution-regrowth 
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650 4 |a surface-protected hollowing process 
650 4 |a the Kirkendall effect 
700 1 |a Yin, Yadong  |e verfasserin  |4 aut 
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