Self-Templating Approaches to Hollow Nanostructures
© 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
| Veröffentlicht in: | Advanced materials (Deerfield Beach, Fla.). - 1998. - 31(2019), 38 vom: 15. Sept., Seite e1802349 |
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| Format: | Online-Aufsatz |
| Sprache: | English |
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2019
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| Zugriff auf das übergeordnete Werk: | Advanced materials (Deerfield Beach, Fla.) |
| Schlagworte: | Journal Article Review Ostwald ripening dissolution-regrowth galvanic replacements hollow nanostructures self-templating surface-protected hollowing process the Kirkendall effect |
| Zusammenfassung: | © 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. This current research progress on the fabrication of hollow nanostructures by using self-templating methods is reviewed. After a brief introduction to the unique properties and applications of hollow nanostructures and the three general fabrication routes, the discussions are focused on the five main self-templating strategies, including galvanic replacement, the Kirkendall effect, Ostwald ripening, dissolution-regrowth, and the surface-protected hollowing process. Some newly developed synthetic routes are selected and discussed in detail. In conclusion, a summary and the perspectives on the directions that might lead the future development of this exciting field are presented |
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| Beschreibung: | Date Completed 27.09.2019 Date Revised 30.09.2020 published: Print-Electronic Citation Status PubMed-not-MEDLINE |
| ISSN: | 1521-4095 |
| DOI: | 10.1002/adma.201802349 |