Vapor-Phase Nanopatterning of Aminosilanes with Electron Beam Lithography : Understanding and Minimizing Background Functionalization

Electron beam lithography (EBL) is a highly precise, serial method for patterning surfaces. Positive tone EBL resists enable patterned exposure of the underlying surface, which can be subsequently functionalized for the application of interest. In the case of widely used native oxide-capped silicon...

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Publié dans:	Langmuir : the ACS journal of surfaces and colloids. - 1985. - 34(2018), 16 vom: 24. Apr., Seite 4780-4792
Auteur principal:	Fetterly, Christopher R (Auteur)
Autres auteurs:	Olsen, Brian C, Luber, Erik J, Buriak, Jillian M
Format:	Article en ligne
Langue:	English
Publié:	2018
Accès à la collection:	Langmuir : the ACS journal of surfaces and colloids
Sujets:	Journal Article Research Support, Non-U.S. Gov't