Vapor-Phase Nanopatterning of Aminosilanes with Electron Beam Lithography : Understanding and Minimizing Background Functionalization

Electron beam lithography (EBL) is a highly precise, serial method for patterning surfaces. Positive tone EBL resists enable patterned exposure of the underlying surface, which can be subsequently functionalized for the application of interest. In the case of widely used native oxide-capped silicon...

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Bibliographische Detailangaben

Veröffentlicht in:	Langmuir : the ACS journal of surfaces and colloids. - 1985. - 34(2018), 16 vom: 24. Apr., Seite 4780-4792
1. Verfasser:	Fetterly, Christopher R (VerfasserIn)
Weitere Verfasser:	Olsen, Brian C, Luber, Erik J, Buriak, Jillian M
Format:	Online-Aufsatz
Sprache:	English
Veröffentlicht:	2018
Zugriff auf das übergeordnete Werk:	Langmuir : the ACS journal of surfaces and colloids
Schlagworte:	Journal Article Research Support, Non-U.S. Gov't