Rapid Wafer-Scale Growth of Polycrystalline 2H-MoS2 by Pulsed Metalorganic Chemical Vapor Deposition
High volume manufacturing of devices based on transition metal dichalcogenide (TMD) ultra-thin films will require deposition techniques that are capable of reproducible wafer-scale growth with monolayer control. To date, TMD growth efforts have largely relied upon sublimation and transport of solid...
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Détails bibliographiques
| Publié dans: | Chemistry of materials : a publication of the American Chemical Society. - 1998. - 29(2017), 15 vom: 08. Aug., Seite 6279-6288
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| Auteur principal: |
Kalanyan, Berc
(Auteur) |
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| Autres auteurs: |
Kimes, William A,
Beams, Ryan,
Stranick, Stephan J,
Garratt, Elias,
Kalish, Irina,
Davydov, Albert V,
Kanjolia, Ravindra K,
Maslar, James E |
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| Format: | Article en ligne
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| Langue: | English |
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| Publié: |
2017
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| Accès à la collection: | Chemistry of materials : a publication of the American Chemical Society
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| Sujets: | Journal Article
CVD
MOCVD
MoS2
metalorganic chemistry
transition metal dichalcogenides |
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