Despite the success of plasma-enhanced atomic layer deposition (PEALD) in depositing quality silicon nitride films, a fundamental understanding of the growth mechanism has been difficult to obtain because of lack of in situ characterization to probe the surface reactions noninvasively and the comple...
Bibliographische Detailangaben
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1985. - 34(2018), 8 vom: 27. Feb., Seite 2619-2629
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| 1. Verfasser: |
Peña, Luis Fabián
(VerfasserIn) |
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| Weitere Verfasser: |
Mattson, Eric C,
Nanayakkara, Charith E,
Oyekan, Kolade A,
Mallikarjunan, Anupama,
Chandra, Haripin,
Xiao, Manchao,
Lei, Xinjian,
Pearlstein, Ronald M,
Derecskei-Kovacs, Agnes,
Chabal, Yves J |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2018
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
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| Schlagworte: | Journal Article
Research Support, U.S. Gov't, Non-P.H.S.
Research Support, Non-U.S. Gov't |
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