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231225s2018    xx |||||o     00| ||eng c | 
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|a 10.1002/adma.201703748 
  |2 doi 
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|a pubmed25n0932.xml 
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  |e rakwb 
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|a eng 
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1 | 
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|a Li, Cheng 
  |e verfasserin 
  |4 aut 
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| 245 | 
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|a Synthesis of Crystalline Black Phosphorus Thin Film on Sapphire 
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| 264 | 
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1 | 
|c 2018 
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| 336 | 
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|a Text 
  |b txt 
  |2 rdacontent 
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|a ƒaComputermedien 
  |b c 
  |2 rdamedia 
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|a ƒa Online-Ressource 
  |b cr 
  |2 rdacarrier 
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|a Date Completed 01.08.2018 
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|a Date Revised 30.09.2020 
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|a published: Print-Electronic 
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|a Citation Status PubMed-not-MEDLINE 
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|a © 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. 
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|a Black phosphorus (BP) has recently attracted significant attention due to its exceptional physical properties. Currently, high-quality few-layer and thin-film BP are produced primarily by mechanical exfoliation, limiting their potential in future applications. Here, the synthesis of highly crystalline thin-film BP on 5 mm sapphire substrates by conversion from red to black phosphorus at 700 °C and 1.5 GPa is demonstrated. The synthesized ≈50 nm thick BP thin films are polycrystalline with a crystal domain size ranging from 40 to 70 µm long, as indicated by Raman mapping and infrared extinction spectroscopy. At room temperature, field-effect mobility of the synthesized BP thin film is found to be around 160 cm2 V-1 s-1 along armchair direction and reaches up to about 200 cm2 V-1 s-1 at around 90 K. Moreover, red phosphorus (RP) covered by exfoliated hexagonal boron nitride (hBN) before conversion shows atomically sharp hBN/BP interface and perfectly layered BP after the conversion. This demonstration represents a critical step toward the future realization of large scale, high-quality BP devices and circuits 
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|a Journal Article 
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| 650 | 
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|a boron nitride/black phosphorus heterostructures 
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| 650 | 
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|a phase transitions 
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4 | 
|a wafer-scale black phosphorus synthesis 
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| 700 | 
1 | 
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|a Wu, Ye 
  |e verfasserin 
  |4 aut 
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| 700 | 
1 | 
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|a Deng, Bingchen 
  |e verfasserin 
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| 700 | 
1 | 
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|a Xie, Yujun 
  |e verfasserin 
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1 | 
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|a Guo, Qiushi 
  |e verfasserin 
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1 | 
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|a Yuan, Shaofan 
  |e verfasserin 
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| 700 | 
1 | 
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|a Chen, Xiaolong 
  |e verfasserin 
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|a Bhuiyan, Maruf 
  |e verfasserin 
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|a Wu, Zishan 
  |e verfasserin 
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|a Watanabe, Kenji 
  |e verfasserin 
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|a Taniguchi, Takashi 
  |e verfasserin 
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|a Wang, Hailiang 
  |e verfasserin 
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|a Cha, Judy J 
  |e verfasserin 
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|a Snure, Michael 
  |e verfasserin 
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|a Fei, Yingwei 
  |e verfasserin 
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|a Xia, Fengnian 
  |e verfasserin 
  |4 aut 
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| 773 | 
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|i Enthalten in 
  |t Advanced materials (Deerfield Beach, Fla.) 
  |d 1998 
  |g 30(2018), 6 vom: 15. Feb. 
  |w (DE-627)NLM098206397 
  |x 1521-4095 
  |7 nnas 
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| 773 | 
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|g volume:30 
  |g year:2018 
  |g number:6 
  |g day:15 
  |g month:02 
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| 856 | 
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|u http://dx.doi.org/10.1002/adma.201703748 
  |3 Volltext 
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|a GBV_ILN_350 
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|a AR 
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|d 30 
  |j 2018 
  |e 6 
  |b 15 
  |c 02 
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