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231225s2018 xx |||||o 00| ||eng c |
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|a 10.1002/adma.201703025
|2 doi
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|a pubmed24n0928.xml
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|a (DE-627)NLM278439675
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|a (NLM)29178141
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|a DE-627
|b ger
|c DE-627
|e rakwb
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|a eng
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| 100 |
1 |
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|a Wu, Xing
|e verfasserin
|4 aut
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| 245 |
1 |
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|a Probing and Manipulating the Interfacial Defects of InGaAs Dual-Layer Metal Oxides at the Atomic Scale
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|c 2018
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
|b cr
|2 rdacarrier
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|a Date Completed 01.08.2018
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|a Date Revised 30.09.2020
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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|a The interface between III-V and metal-oxide-semiconductor materials plays a central role in the operation of high-speed electronic devices, such as transistors and light-emitting diodes. The high-speed property gives the light-emitting diodes a high response speed and low dark current, and they are widely used in communications, infrared remote sensing, optical detection, and other fields. The rational design of high-performance devices requires a detailed understanding of the electronic structure at this interface; however, this understanding remains a challenge, given the complex nature of surface interactions and the dynamic relationship between the morphology evolution and electronic structures. Herein, in situ transmission electron microscopy is used to probe and manipulate the structural and electrical properties of ZrO2 films on Al2 O3 and InGaAs substrate at the atomic scale. Interfacial defects resulting from the spillover of the oxygen-atom conduction-band wavefunctions are resolved. This study unearths the fundamental defect-driven interfacial electric structure of III-V semiconductor materials and paves the way to future high-speed and high-reliability devices
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|a Journal Article
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|a III-V semiconductors
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|a breakdown
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|a in situ transmission electron microscope
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4 |
|a interfacial defects
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|a oxygen vacancies
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1 |
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|a Luo, Chen
|e verfasserin
|4 aut
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1 |
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|a Hao, Peng
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Sun, Tao
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Wang, Runsheng
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Wang, Chaolun
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Hu, Zhigao
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Li, Yawei
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Zhang, Jian
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Bersuker, Gennadi
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Sun, Litao
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Pey, Kinleong
|e verfasserin
|4 aut
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| 773 |
0 |
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 30(2018), 2 vom: 27. Jan.
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnns
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| 773 |
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|g volume:30
|g year:2018
|g number:2
|g day:27
|g month:01
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|u http://dx.doi.org/10.1002/adma.201703025
|3 Volltext
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