Reaction Mechanisms of the Atomic Layer Deposition of Tin Oxide Thin Films Using Tributyltin Ethoxide and Ozone
Uniform and conformal deposition of tin oxide thin films is important for several applications in electronics, gas sensing, and transparent conducting electrodes. Thermal atomic layer deposition (ALD) is often best suited for these applications, but its implementation requires a mechanistic understa...
Ausführliche Beschreibung
Bibliographische Detailangaben
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 33(2017), 24 vom: 20. Juni, Seite 5998-6004
|
|---|
| 1. Verfasser: |
Nanayakkara, Charith E
(VerfasserIn) |
|---|
| Weitere Verfasser: |
Liu, Guo,
Vega, Abraham,
Dezelah, Charles L,
Kanjolia, Ravindra K,
Chabal, Yves J |
|---|
| Format: | Online-Aufsatz
|
|---|
| Sprache: | English |
|---|
| Veröffentlicht: |
2017
|
|---|
| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
|
|---|
| Schlagworte: | Journal Article
Research Support, U.S. Gov't, Non-P.H.S. |
|---|