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231224s2016 xx |||||o 00| ||eng c |
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|a 10.1002/adma.201505154
|2 doi
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|a pubmed24n0856.xml
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|a (NLM)26808483
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|a DE-627
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|a eng
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|a Liu, Xiaochi
|e verfasserin
|4 aut
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|a P-Type Polar Transition of Chemically Doped Multilayer MoS2 Transistor
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|c 2016
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
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|2 rdamedia
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|a ƒa Online-Ressource
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|a Date Completed 25.07.2016
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|a Date Revised 01.10.2020
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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|a A high-performance multilayer MoS2 p-type field-effect transistor is realized via controllable chemical doping, which shows an excellent on/off ratio of 10(9) and a maximum hole mobility of 132 cm(2) V(-1) s(-1) at 133 K. The developed technique will enable 2D materials to be used for future high-efficiency and low-power semiconductor device applications
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|a Journal Article
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|a MoS2
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|a chemical doping
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|a contact resistance
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|a p-type
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|a transistors
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|a Qu, Deshun
|e verfasserin
|4 aut
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|a Ryu, Jungjin
|e verfasserin
|4 aut
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|a Ahmed, Faisal
|e verfasserin
|4 aut
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|a Yang, Zheng
|e verfasserin
|4 aut
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|a Lee, Daeyeong
|e verfasserin
|4 aut
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|a Yoo, Won Jong
|e verfasserin
|4 aut
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 28(2016), 12 vom: 23. März, Seite 2345-51
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnns
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|g volume:28
|g year:2016
|g number:12
|g day:23
|g month:03
|g pages:2345-51
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|u http://dx.doi.org/10.1002/adma.201505154
|3 Volltext
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