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231224s2015 xx |||||o 00| ||eng c |
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|a 10.1021/acs.langmuir.5b00453
|2 doi
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|a pubmed24n0824.xml
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|a (DE-627)NLM247314943
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|a (NLM)25797472
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|a DE-627
|b ger
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|e rakwb
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| 041 |
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|a eng
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| 100 |
1 |
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|a Anyfantakis, Manos
|e verfasserin
|4 aut
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| 245 |
1 |
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|a Modulation of the coffee-ring effect in particle/surfactant mixtures
|b the importance of particle-interface interactions
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|c 2015
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
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|2 rdamedia
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|a ƒa Online-Ressource
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|a Date Completed 13.08.2015
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|a Date Revised 14.04.2015
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a We study the effect of surfactants on the deposits formed after the evaporation of colloidal suspension drops, at initial concentrations lower than the critical micellar concentrations, for various particle/surfactant mixtures. We show that the surfactant-mediated interactions between particles and the liquid-gas (LG) and liquid-solid (LS) interfaces, rather than the flow patterns, primarily define the morphology of the dry deposit in a robust and reproducible manner. For like-charged particle/surfactant mixtures, most of the particles form a ring-shaped deposit (according to the so-called "Coffee-Ring Effect"), but some particles can also be deposited inside the ring in a way that is modulated by electrostatic interactions between the particles and the LS interface. For oppositely charged systems, surfactant adsorption to the particle surface strongly affects particle-LG interface interactions, which in turn control the deposition pattern. For low surfactant concentrations, coffee-rings are systematically observed. For intermediate concentrations, the charge of surfactant-decorated particles becomes nearly neutral, and their hydrophobicity is enhanced, which promotes particle trapping at the LG interface. A particle skin is formed and its deposition upon drying leads to homogeneous disk-like patterns. For high surfactant concentrations, particle charge is reversed, and coffee-rings are observed again. Notably, this ring-disk-ring evolution of the deposition behavior as a function of surfactant concentration is observed in a variety of mixtures, regardless of particle absolute charge and surface chemistry as well as of surfactant charge and hydrophobicity. Its apparent universal character makes it a promising strategy for a robust control of particle deposition from evaporating drops
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|a Journal Article
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|a Geng, Zheng
|e verfasserin
|4 aut
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|a Morel, Mathieu
|e verfasserin
|4 aut
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|a Rudiuk, Sergii
|e verfasserin
|4 aut
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|a Baigl, Damien
|e verfasserin
|4 aut
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| 773 |
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1992
|g 31(2015), 14 vom: 14. Apr., Seite 4113-20
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|x 1520-5827
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|g volume:31
|g year:2015
|g number:14
|g day:14
|g month:04
|g pages:4113-20
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|u http://dx.doi.org/10.1021/acs.langmuir.5b00453
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