In situ synchrotron X-ray diffraction analysis of deformation behaviour in Ti-Ni-based thin films

Deformation mechanisms of as-deposited and post-annealed Ti50.2Ni49.6, Ti50.3Ni46.2Cu3.5 and Ti48.5Ni40.8Cu7.5 thin films were investigated using the in situ synchrotron X-ray diffraction technique. Results showed that initial crystalline phases determined the deformation mechanisms of all the films...

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Veröffentlicht in:	Journal of synchrotron radiation. - 1994. - 22(2015), 1 vom: 21. Jan., Seite 34-41
1. Verfasser:	Wang, Hong (VerfasserIn)
Weitere Verfasser:	Sun, Guangai, Wang, Xiaolin, Chen, Bo, Zu, Xiaotao, Liu, Yanping, Li, Liangbin, Pan, Guoqiang, Sheng, Liusi, Liu, Yaoguang, Fu, Yong Qing
Format:	Online-Aufsatz
Sprache:	English
Veröffentlicht:	2015
Zugriff auf das übergeordnete Werk:	Journal of synchrotron radiation
Schlagworte:	Journal Article Research Support, Non-U.S. Gov't Ti–Ni deformation behaviour detwinning shape memory synchrotron X-ray diffraction thin film