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231224s2014 xx |||||o 00| ||eng c |
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|a 10.1021/la503481r
|2 doi
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|a pubmed24n0806.xml
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|a (DE-627)NLM241962439
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|a (NLM)25227560
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|a DE-627
|b ger
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|e rakwb
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|a eng
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|a Zhao, Haoyan
|e verfasserin
|4 aut
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|a Volatilize-controlled oriented growth of the single-crystal layer for organic field-effect transistors
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|c 2014
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
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|2 rdacarrier
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|a Date Completed 21.05.2015
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|a Date Revised 14.10.2014
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a We demonstrate a solution method of volatilize-controlled oriented growth (VOG) to fabricate aligned single crystals of 6,13-bis(triisopropylsilylethynyl) pentacene (TIPS pentacene) on a Si/SiO2 substrate. Through controlling the evaporation rate of the solvent, large-area-aligned single-crystal layers can be achieved on several substrates at the same time, covering over 90% on 2 × 1 cm substrates. The method provides a low-cost, maneuverable technology, which has potential to be used in batch production. We find that the atmosphere of the solvent with high dissolving capacity is in favor of aligned single-crystal growth. Besides, the growth mechanism of the VOG method is investigated in this paper. Top-contact organic field-effect transistors based on the single crystals of TIPS pentacene are achieved on a Si/SiO2 substrate. The optimal device exhibits a field-effect mobility of 0.42 cm(2) V(-1) s(-1) and an on/off current ratio of 10(5). Our research indicates that the VOG method is promising in single-crystal growth on a Si/SiO2 substrate for commercial production
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|a Journal Article
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|a Li, Dong
|e verfasserin
|4 aut
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|a Dong, Guifang
|e verfasserin
|4 aut
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|a Duan, Lian
|e verfasserin
|4 aut
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|a Liu, Xiaohui
|e verfasserin
|4 aut
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|a Wang, Liduo
|e verfasserin
|4 aut
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1992
|g 30(2014), 40 vom: 14. Okt., Seite 12082-8
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|x 1520-5827
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|g volume:30
|g year:2014
|g number:40
|g day:14
|g month:10
|g pages:12082-8
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|u http://dx.doi.org/10.1021/la503481r
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