The Patterning of Sub-500 nm Inorganic Oxide Structures

Copyright © 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 20(2008), 14 vom: 17. Juli, Seite 2667-73
1. Verfasser: Hampton, Meredith J (VerfasserIn)
Weitere Verfasser: Williams, Stuart S, Zhou, Zhilian, Nunes, Janine, Ko, Doo-Hyun, Templeton, Joseph L, Samulski, Edward T, DeSimone, Joseph M
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2008
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article embossing inorganic oxides patterning perfluoropolyether elastomers polymers soft lithography
LEADER 01000naa a22002652 4500
001 NLM241833558
003 DE-627
005 20231224125111.0
007 cr uuu---uuuuu
008 231224s2008 xx |||||o 00| ||eng c
024 7 |a 10.1002/adma.200702495  |2 doi 
028 5 2 |a pubmed24n0806.xml 
035 |a (DE-627)NLM241833558 
035 |a (NLM)25213887 
040 |a DE-627  |b ger  |c DE-627  |e rakwb 
041 |a eng 
100 1 |a Hampton, Meredith J  |e verfasserin  |4 aut 
245 1 4 |a The Patterning of Sub-500 nm Inorganic Oxide Structures 
264 1 |c 2008 
336 |a Text  |b txt  |2 rdacontent 
337 |a ƒaComputermedien  |b c  |2 rdamedia 
338 |a ƒa Online-Ressource  |b cr  |2 rdacarrier 
500 |a Date Completed 13.09.2014 
500 |a Date Revised 30.09.2020 
500 |a published: Print-Electronic 
500 |a Citation Status PubMed-not-MEDLINE 
520 |a Copyright © 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. 
520 |a Elastomeric perfluoropolyether molds are applied to pattern arrays of sub-500 nm inorganic oxide features. This versatile soft-lithography technique can be used to pattern a wide range of materials; in this work inorganic oxides including TiO2 , SnO2 , ZnO, ITO, and BaTiO3 are patterned on a variety of substrates with different aspect ratios. An example of TiO2 posts is shown in the figure 
650 4 |a Journal Article 
650 4 |a embossing 
650 4 |a inorganic oxides 
650 4 |a patterning 
650 4 |a perfluoropolyether elastomers 
650 4 |a polymers 
650 4 |a soft lithography 
700 1 |a Williams, Stuart S  |e verfasserin  |4 aut 
700 1 |a Zhou, Zhilian  |e verfasserin  |4 aut 
700 1 |a Nunes, Janine  |e verfasserin  |4 aut 
700 1 |a Ko, Doo-Hyun  |e verfasserin  |4 aut 
700 1 |a Templeton, Joseph L  |e verfasserin  |4 aut 
700 1 |a Samulski, Edward T  |e verfasserin  |4 aut 
700 1 |a DeSimone, Joseph M  |e verfasserin  |4 aut 
773 0 8 |i Enthalten in  |t Advanced materials (Deerfield Beach, Fla.)  |d 1998  |g 20(2008), 14 vom: 17. Juli, Seite 2667-73  |w (DE-627)NLM098206397  |x 1521-4095  |7 nnns 
773 1 8 |g volume:20  |g year:2008  |g number:14  |g day:17  |g month:07  |g pages:2667-73 
856 4 0 |u http://dx.doi.org/10.1002/adma.200702495  |3 Volltext 
912 |a GBV_USEFLAG_A 
912 |a SYSFLAG_A 
912 |a GBV_NLM 
912 |a GBV_ILN_350 
951 |a AR 
952 |d 20  |j 2008  |e 14  |b 17  |c 07  |h 2667-73