The Patterning of Sub-500 nm Inorganic Oxide Structures

The Patterning of Sub-500 nm Inorganic Oxide Structures

Copyright © 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 20(2008), 14 vom: 17. Juli, Seite 2667-73
1. Verfasser: Hampton, Meredith J (VerfasserIn)
Weitere Verfasser: Williams, Stuart S, Zhou, Zhilian, Nunes, Janine, Ko, Doo-Hyun, Templeton, Joseph L, Samulski, Edward T, DeSimone, Joseph M
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2008
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article embossing inorganic oxides patterning perfluoropolyether elastomers polymers soft lithography
Beschreibung
Zusammenfassung:Copyright © 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Elastomeric perfluoropolyether molds are applied to pattern arrays of sub-500 nm inorganic oxide features. This versatile soft-lithography technique can be used to pattern a wide range of materials; in this work inorganic oxides including TiO2 , SnO2 , ZnO, ITO, and BaTiO3 are patterned on a variety of substrates with different aspect ratios. An example of TiO2 posts is shown in the figure
Beschreibung:Date Completed 13.09.2014
Date Revised 30.09.2020
published: Print-Electronic
Citation Status PubMed-not-MEDLINE
ISSN:1521-4095
DOI:10.1002/adma.200702495