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231224s2014 xx |||||o 00| ||eng c |
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7 |
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|a 10.1021/la500996a
|2 doi
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|a pubmed24n0790.xml
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|a eng
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1 |
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|a Men, Yonghong
|e verfasserin
|4 aut
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| 245 |
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|a Controlled evaporative self-assembly of poly(acrylic acid) in a confined geometry for fabricating patterned polymer brushes
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|c 2014
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
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|a Date Completed 15.04.2015
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|a Date Revised 25.11.2016
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|a published: Print-Electronic
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|a Citation Status MEDLINE
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|a A simple yet robust approach was exploited to fabricate large-scaled patterned polymer brushes by combining controlled evaporative self-assembly (CESA) in a confined geometry and self-initiated photografting and photopolymerization (SIPGP). Our method was carried out without any sophisticated instruments, free of lithography, overcoming current difficulties in fabricating polymer patterns by using complex instruments
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|a Journal Article
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|a Research Support, Non-U.S. Gov't
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|a Acrylic Resins
|2 NLM
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|a Polymers
|2 NLM
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|a carbopol 940
|2 NLM
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|a 4Q93RCW27E
|2 NLM
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| 700 |
1 |
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|a Xiao, Peng
|e verfasserin
|4 aut
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| 700 |
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|a Chen, Jing
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Fu, Jun
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Huang, Youju
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Zhang, Jiawei
|e verfasserin
|4 aut
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1 |
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|a Xie, Zhengchao
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Wang, Wenqin
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Chen, Tao
|e verfasserin
|4 aut
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| 773 |
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1992
|g 30(2014), 16 vom: 29. Apr., Seite 4863-7
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|x 1520-5827
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|g volume:30
|g year:2014
|g number:16
|g day:29
|g month:04
|g pages:4863-7
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