Controlled evaporative self-assembly of poly(acrylic acid) in a confined geometry for fabricating patterned polymer brushes
A simple yet robust approach was exploited to fabricate large-scaled patterned polymer brushes by combining controlled evaporative self-assembly (CESA) in a confined geometry and self-initiated photografting and photopolymerization (SIPGP). Our method was carried out without any sophisticated instru...
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Bibliographische Detailangaben
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 30(2014), 16 vom: 29. Apr., Seite 4863-7
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| 1. Verfasser: |
Men, Yonghong
(VerfasserIn) |
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| Weitere Verfasser: |
Xiao, Peng,
Chen, Jing,
Fu, Jun,
Huang, Youju,
Zhang, Jiawei,
Xie, Zhengchao,
Wang, Wenqin,
Chen, Tao |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2014
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
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| Schlagworte: | Journal Article
Research Support, Non-U.S. Gov't
Acrylic Resins
Polymers
carbopol 940
4Q93RCW27E |
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