Controlled evaporative self-assembly of poly(acrylic acid) in a confined geometry for fabricating patterned polymer brushes
A simple yet robust approach was exploited to fabricate large-scaled patterned polymer brushes by combining controlled evaporative self-assembly (CESA) in a confined geometry and self-initiated photografting and photopolymerization (SIPGP). Our method was carried out without any sophisticated instru...
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 30(2014), 16 vom: 29. Apr., Seite 4863-7 |
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| 1. Verfasser: | |
| Weitere Verfasser: | , , , , , , , |
| Format: | Online-Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
2014
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids |
| Schlagworte: | Journal Article Research Support, Non-U.S. Gov't Acrylic Resins Polymers carbopol 940 4Q93RCW27E |
| Zusammenfassung: | A simple yet robust approach was exploited to fabricate large-scaled patterned polymer brushes by combining controlled evaporative self-assembly (CESA) in a confined geometry and self-initiated photografting and photopolymerization (SIPGP). Our method was carried out without any sophisticated instruments, free of lithography, overcoming current difficulties in fabricating polymer patterns by using complex instruments |
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| Beschreibung: | Date Completed 15.04.2015 Date Revised 25.11.2016 published: Print-Electronic Citation Status MEDLINE |
| ISSN: | 1520-5827 |
| DOI: | 10.1021/la500996a |