Intrinsically switchable, high-Q ferroelectricon-silicon composite film bulk acoustic resonators
This paper presents a voltage-controlled, highquality factor (Q) composite thin-film bulk acoustic resonator (FBAR) at 1.28 GHz. The composite FBAR consists of a thin layer of barium strontium titanate (BST) that is sandwiched between two electrodes deposited on a silicon-on-insulator (SOI) wafer. T...
Veröffentlicht in: | IEEE transactions on ultrasonics, ferroelectrics, and frequency control. - 1986. - 61(2014), 2 vom: 28. Feb., Seite 231-8 |
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Weitere Verfasser: | , , , , |
Format: | Online-Aufsatz |
Sprache: | English |
Veröffentlicht: |
2014
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Zugriff auf das übergeordnete Werk: | IEEE transactions on ultrasonics, ferroelectrics, and frequency control |
Schlagworte: | Evaluation Study Journal Article Research Support, U.S. Gov't, Non-P.H.S. Membranes, Artificial Silicon Z4152N8IUI |
Zusammenfassung: | This paper presents a voltage-controlled, highquality factor (Q) composite thin-film bulk acoustic resonator (FBAR) at 1.28 GHz. The composite FBAR consists of a thin layer of barium strontium titanate (BST) that is sandwiched between two electrodes deposited on a silicon-on-insulator (SOI) wafer. The BST layer, which has a strong electrostrictive effect, is used for electromechanical transduction by means of its voltage-induced piezoelectricity. The silicon layer, with its low mechanical loss, increases the Q of the resonator. The composite FBAR presented here exhibits Qs exceeding 800 with a resonance frequency and Q product (f × Q) of 1026 GHz |
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Beschreibung: | Date Completed 23.09.2014 Date Revised 10.12.2019 published: Print Citation Status MEDLINE |
ISSN: | 1525-8955 |
DOI: | 10.1109/TUFFC.2014.6722609 |