Intrinsically switchable, high-Q ferroelectricon-silicon composite film bulk acoustic resonators

This paper presents a voltage-controlled, highquality factor (Q) composite thin-film bulk acoustic resonator (FBAR) at 1.28 GHz. The composite FBAR consists of a thin layer of barium strontium titanate (BST) that is sandwiched between two electrodes deposited on a silicon-on-insulator (SOI) wafer. T...

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Bibliographische Detailangaben
Veröffentlicht in:IEEE transactions on ultrasonics, ferroelectrics, and frequency control. - 1986. - 61(2014), 2 vom: 28. Feb., Seite 231-8
1. Verfasser: Sis, Seyit Ahmet (VerfasserIn)
Weitere Verfasser: Lee, Seungku, Lee, Victor, Bayraktaroglu, Adrian K, Phillips, Jamie D, Mortazawi, Amir
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2014
Zugriff auf das übergeordnete Werk:IEEE transactions on ultrasonics, ferroelectrics, and frequency control
Schlagworte:Evaluation Study Journal Article Research Support, U.S. Gov't, Non-P.H.S. Membranes, Artificial Silicon Z4152N8IUI
Beschreibung
Zusammenfassung:This paper presents a voltage-controlled, highquality factor (Q) composite thin-film bulk acoustic resonator (FBAR) at 1.28 GHz. The composite FBAR consists of a thin layer of barium strontium titanate (BST) that is sandwiched between two electrodes deposited on a silicon-on-insulator (SOI) wafer. The BST layer, which has a strong electrostrictive effect, is used for electromechanical transduction by means of its voltage-induced piezoelectricity. The silicon layer, with its low mechanical loss, increases the Q of the resonator. The composite FBAR presented here exhibits Qs exceeding 800 with a resonance frequency and Q product (f × Q) of 1026 GHz
Beschreibung:Date Completed 23.09.2014
Date Revised 10.12.2019
published: Print
Citation Status MEDLINE
ISSN:1525-8955
DOI:10.1109/TUFFC.2014.6722609