Line patterns from cylinder-forming photocleavable block copolymers

Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 25(2013), 34 vom: 14. Sept., Seite 4690-5
1. Verfasser: Gu, Weiyin (VerfasserIn)
Weitere Verfasser: Zhao, Hui, Wei, Qingshuo, Coughlin, E Bryan, Theato, Patrick, Russell, Thomas P
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2013
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article Research Support, Non-U.S. Gov't Research Support, U.S. Gov't, Non-P.H.S. block copolymers line patterns nanotemplates photocleavable self-assembly
LEADER 01000naa a22002652 4500
001 NLM229295061
003 DE-627
005 20231224081837.0
007 cr uuu---uuuuu
008 231224s2013 xx |||||o 00| ||eng c
024 7 |a 10.1002/adma.201301556  |2 doi 
028 5 2 |a pubmed24n0764.xml 
035 |a (DE-627)NLM229295061 
035 |a (NLM)23868791 
040 |a DE-627  |b ger  |c DE-627  |e rakwb 
041 |a eng 
100 1 |a Gu, Weiyin  |e verfasserin  |4 aut 
245 1 0 |a Line patterns from cylinder-forming photocleavable block copolymers 
264 1 |c 2013 
336 |a Text  |b txt  |2 rdacontent 
337 |a ƒaComputermedien  |b c  |2 rdamedia 
338 |a ƒa Online-Ressource  |b cr  |2 rdacarrier 
500 |a Date Completed 24.03.2014 
500 |a Date Revised 30.09.2020 
500 |a published: Print-Electronic 
500 |a Citation Status PubMed-not-MEDLINE 
520 |a Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. 
520 |a A robust route for the preparation of nanoscopic line patterns from polystyrene-block-poly(ethylene oxide) featuring a photocleavable o-nitrobenzyl ester junction is demonstrated. After mild UV (λ = 365 nm) exposure and selective removal of the PEO microdomains, the polymer trench patterns are used as scaffold to fabricate highly ordered arrays of silica or Au line patterns 
650 4 |a Journal Article 
650 4 |a Research Support, Non-U.S. Gov't 
650 4 |a Research Support, U.S. Gov't, Non-P.H.S. 
650 4 |a block copolymers 
650 4 |a line patterns 
650 4 |a nanotemplates 
650 4 |a photocleavable 
650 4 |a self-assembly 
700 1 |a Zhao, Hui  |e verfasserin  |4 aut 
700 1 |a Wei, Qingshuo  |e verfasserin  |4 aut 
700 1 |a Coughlin, E Bryan  |e verfasserin  |4 aut 
700 1 |a Theato, Patrick  |e verfasserin  |4 aut 
700 1 |a Russell, Thomas P  |e verfasserin  |4 aut 
773 0 8 |i Enthalten in  |t Advanced materials (Deerfield Beach, Fla.)  |d 1998  |g 25(2013), 34 vom: 14. Sept., Seite 4690-5  |w (DE-627)NLM098206397  |x 1521-4095  |7 nnns 
773 1 8 |g volume:25  |g year:2013  |g number:34  |g day:14  |g month:09  |g pages:4690-5 
856 4 0 |u http://dx.doi.org/10.1002/adma.201301556  |3 Volltext 
912 |a GBV_USEFLAG_A 
912 |a SYSFLAG_A 
912 |a GBV_NLM 
912 |a GBV_ILN_350 
951 |a AR 
952 |d 25  |j 2013  |e 34  |b 14  |c 09  |h 4690-5