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231224s2013 xx |||||o 00| ||eng c |
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|a 10.1002/adma.201301556
|2 doi
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|a pubmed24n0764.xml
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|a eng
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| 100 |
1 |
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|a Gu, Weiyin
|e verfasserin
|4 aut
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|a Line patterns from cylinder-forming photocleavable block copolymers
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|c 2013
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|a Text
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|2 rdacontent
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|a ƒaComputermedien
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|2 rdamedia
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|a ƒa Online-Ressource
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|a Date Completed 24.03.2014
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|a Date Revised 30.09.2020
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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|a A robust route for the preparation of nanoscopic line patterns from polystyrene-block-poly(ethylene oxide) featuring a photocleavable o-nitrobenzyl ester junction is demonstrated. After mild UV (λ = 365 nm) exposure and selective removal of the PEO microdomains, the polymer trench patterns are used as scaffold to fabricate highly ordered arrays of silica or Au line patterns
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|a Journal Article
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|a Research Support, Non-U.S. Gov't
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|a Research Support, U.S. Gov't, Non-P.H.S.
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|a block copolymers
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|a line patterns
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|a nanotemplates
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|a photocleavable
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|a self-assembly
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|a Zhao, Hui
|e verfasserin
|4 aut
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1 |
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|a Wei, Qingshuo
|e verfasserin
|4 aut
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|a Coughlin, E Bryan
|e verfasserin
|4 aut
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|a Theato, Patrick
|e verfasserin
|4 aut
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|a Russell, Thomas P
|e verfasserin
|4 aut
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| 773 |
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 25(2013), 34 vom: 14. Sept., Seite 4690-5
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnns
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|g volume:25
|g year:2013
|g number:34
|g day:14
|g month:09
|g pages:4690-5
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|u http://dx.doi.org/10.1002/adma.201301556
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