APA Zitierstil

Gu, W., Zhao, H., Wei, Q., Coughlin, E. B., Theato, P., & Russell, T. P. (2013). Line patterns from cylinder-forming photocleavable block copolymers. Advanced materials (Deerfield Beach, Fla.), 25(34), 4690. https://doi.org/10.1002/adma.201301556

Chicago Zitierstil

Gu, Weiyin, Hui Zhao, Qingshuo Wei, E Bryan Coughlin, Patrick Theato, und Thomas P. Russell. "Line Patterns from Cylinder-forming Photocleavable Block Copolymers." Advanced Materials (Deerfield Beach, Fla.) 25, no. 34 (2013): 4690. https://dx.doi.org/10.1002/adma.201301556.

MLA Zitierstil

Gu, Weiyin, et al. "Line Patterns from Cylinder-forming Photocleavable Block Copolymers." Advanced Materials (Deerfield Beach, Fla.), vol. 25, no. 34, 2013, p. 4690.