Dual-stage lithography from a light-driven, plasmon-assisted process : a hierarchical approach to subwavelength features
A hierarchy of lithographic-type imaging generating 3 μm lines incorporating subdiffraction limit features was obtained through a novel two-step reaction process. Photochemically generated ketyl radicals were used to make defined lines of silver nanoparticles. The excitation of nanoparticle surface...
| Publié dans: | Langmuir : the ACS journal of surfaces and colloids. - 1985. - 28(2012), 30 vom: 31. Juli, Seite 10957-61 |
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| Auteur principal: | |
| Autres auteurs: | , |
| Format: | Article en ligne |
| Langue: | English |
| Publié: |
2012
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| Accès à la collection: | Langmuir : the ACS journal of surfaces and colloids |
| Sujets: | Journal Article |
| Résumé: | A hierarchy of lithographic-type imaging generating 3 μm lines incorporating subdiffraction limit features was obtained through a novel two-step reaction process. Photochemically generated ketyl radicals were used to make defined lines of silver nanoparticles. The excitation of nanoparticle surface plasmons was then used to generate highly localized heat that causes polymerization selectively on the surfaces of excited particles. The nylon-6 polymer that is generated serves as a solubility switch used to retain the features on the substrate selectively; various imaging techniques were used to establish the nature of the nylon shells. This work shows that the heat generated by plasmon excitation can be exploited to generate negative-type lithographic features with dimensions well below the diffraction limit |
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| Description: | Date Completed 20.12.2012 Date Revised 31.07.2012 published: Print-Electronic Citation Status PubMed-not-MEDLINE |
| ISSN: | 1520-5827 |
| DOI: | 10.1021/la301728r |