APA Zitierstil

Stamplecoskie, K. G., Fasciani, C., & Scaiano, J. C. (2012). Dual-stage lithography from a light-driven, plasmon-assisted process: A hierarchical approach to subwavelength features. Langmuir : the ACS journal of surfaces and colloids, 28(30), 10957. https://doi.org/10.1021/la301728r

Chicago Zitierstil

Stamplecoskie, Kevin G., Chiara Fasciani, und Juan C. Scaiano. "Dual-stage Lithography from a Light-driven, Plasmon-assisted Process: A Hierarchical Approach to Subwavelength Features." Langmuir : The ACS Journal of Surfaces and Colloids 28, no. 30 (2012): 10957. https://dx.doi.org/10.1021/la301728r.

MLA Zitierstil

Stamplecoskie, Kevin G., et al. "Dual-stage Lithography from a Light-driven, Plasmon-assisted Process: A Hierarchical Approach to Subwavelength Features." Langmuir : The ACS Journal of Surfaces and Colloids, vol. 28, no. 30, 2012, p. 10957.