Dual-stage lithography from a light-driven, plasmon-assisted process : a hierarchical approach to subwavelength features
A hierarchy of lithographic-type imaging generating 3 μm lines incorporating subdiffraction limit features was obtained through a novel two-step reaction process. Photochemically generated ketyl radicals were used to make defined lines of silver nanoparticles. The excitation of nanoparticle surface...
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1985. - 28(2012), 30 vom: 31. Juli, Seite 10957-61 |
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| Format: | Online-Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
2012
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids |
| Schlagworte: | Journal Article |
| Online verfügbar |
Volltext |