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231224s2012 xx |||||o 00| ||eng c |
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|a 10.1021/la300045z
|2 doi
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|a pubmed25n0717.xml
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|a (DE-627)NLM215128699
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|a (NLM)22304361
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|a DE-627
|b ger
|c DE-627
|e rakwb
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|a eng
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| 100 |
1 |
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|a Dendooven, Jolien
|e verfasserin
|4 aut
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|a In situ monitoring of atomic layer deposition in nanoporous thin films using ellipsometric porosimetry
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|c 2012
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
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|2 rdamedia
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|a ƒa Online-Ressource
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|2 rdacarrier
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|a Date Completed 13.06.2012
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|a Date Revised 28.02.2012
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2012 American Chemical Society
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|a Ellipsometric porosimetry (EP) is a handy technique to characterize the porosity and pore size distribution of porous thin films with pore diameters in the range from below 1 nm up to 50 nm and for the characterization of porous low-k films especially. Atomic layer deposition (ALD) can be used to functionalize porous films and membranes, e.g., for the development of filtration and sensor devices and catalytic surfaces. In this work we report on the implementation of the EP technique onto an ALD reactor. This combination allowed us to employ EP for monitoring the modification of a porous thin film through ALD without removing the sample from the deposition setup. The potential of in situ EP for providing information about the effect of ALD coating on the accessible porosity, the pore radius distribution, the thickness, and mechanical properties of a porous film is demonstrated in the ALD of TiO(2) in a mesoporous silica film
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|a Journal Article
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1 |
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|a Devloo-Casier, Kilian
|e verfasserin
|4 aut
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1 |
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|a Levrau, Elisabeth
|e verfasserin
|4 aut
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1 |
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|a Van Hove, Robbert
|e verfasserin
|4 aut
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1 |
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|a Sree, Sreeprasanth Pulinthanathu
|e verfasserin
|4 aut
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1 |
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|a Baklanov, Mikhail R
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Martens, Johan A
|e verfasserin
|4 aut
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|a Detavernier, Christophe
|e verfasserin
|4 aut
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| 773 |
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1985
|g 28(2012), 8 vom: 28. Feb., Seite 3852-9
|w (DE-627)NLM098181009
|x 1520-5827
|7 nnas
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| 773 |
1 |
8 |
|g volume:28
|g year:2012
|g number:8
|g day:28
|g month:02
|g pages:3852-9
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|u http://dx.doi.org/10.1021/la300045z
|3 Volltext
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