Sputtered SiO2 as low acoustic impedance material for Bragg mirror fabrication in BAW resonators

In this paper we describe the procedure to sputter low acoustic impedance SiO(2) films to be used as a low acoustic impedance layer in Bragg mirrors for BAW resonators. The composition and structure of the material are assessed through infrared absorption spectroscopy. The acoustic properties of the...

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Bibliographische Detailangaben
Veröffentlicht in:IEEE transactions on ultrasonics, ferroelectrics, and frequency control. - 1986. - 57(2010), 1 vom: 19. Jan., Seite 23-9
1. Verfasser: Olivares, Jimena (VerfasserIn)
Weitere Verfasser: Wegmann, Enrique, Capilla, José, Iborra, Enrique, Clement, Marta, Vergara, Lucía, Aigner, Robert
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2010
Zugriff auf das übergeordnete Werk:IEEE transactions on ultrasonics, ferroelectrics, and frequency control
Schlagworte:Journal Article Research Support, Non-U.S. Gov't Silicon Dioxide 7631-86-9