Sputtered SiO2 as low acoustic impedance material for Bragg mirror fabrication in BAW resonators
In this paper we describe the procedure to sputter low acoustic impedance SiO(2) films to be used as a low acoustic impedance layer in Bragg mirrors for BAW resonators. The composition and structure of the material are assessed through infrared absorption spectroscopy. The acoustic properties of the...
Ausführliche Beschreibung
Bibliographische Detailangaben
Veröffentlicht in: | IEEE transactions on ultrasonics, ferroelectrics, and frequency control. - 1986. - 57(2010), 1 vom: 19. Jan., Seite 23-9
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1. Verfasser: |
Olivares, Jimena
(VerfasserIn) |
Weitere Verfasser: |
Wegmann, Enrique,
Capilla, José,
Iborra, Enrique,
Clement, Marta,
Vergara, Lucía,
Aigner, Robert |
Format: | Online-Aufsatz
|
Sprache: | English |
Veröffentlicht: |
2010
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Zugriff auf das übergeordnete Werk: | IEEE transactions on ultrasonics, ferroelectrics, and frequency control
|
Schlagworte: | Journal Article
Research Support, Non-U.S. Gov't
Silicon Dioxide
7631-86-9 |