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231223s2009 xx |||||o 00| ||eng c |
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|a 10.1021/la900902f
|2 doi
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|a eng
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| 100 |
1 |
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|a Oda, Hirokazu
|e verfasserin
|4 aut
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| 245 |
1 |
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|a Photoreactive chemisorbed monolayer suppressing polymer dewetting in thermal nanoimprint lithography
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| 264 |
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|c 2009
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
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|2 rdamedia
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|a ƒa Online-Ressource
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|a Date Completed 17.08.2009
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|a Date Revised 09.06.2009
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|a published: Print
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|a Citation Status PubMed-not-MEDLINE
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|a We describe reactive-monolayer-assisted thermal nanoimprint lithography. The reactive monolayer inducing the graft reaction with thermoplastic poly(styrene) by ultraviolet light exposure was formed from 4-((10-mercaptodecyl)oxy)benzophenone on a gold thin film. The photochemical graft reaction suppressed the thermally induced dewetting of a poly(styrene) thin film on the modified gold surface. As a result, the poly(styrene) thin film used as a resist layer for wet etching could be patterned by thermal nanoimprint lithography, and 100-nm-scale patterns of a gold thin film could be prepared simply by wet etching
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|a Journal Article
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1 |
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|a Ohtake, Tomoyuki
|e verfasserin
|4 aut
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|a Takaoka, Toshiaki
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Nakagawa, Masaru
|e verfasserin
|4 aut
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| 773 |
0 |
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1992
|g 25(2009), 12 vom: 16. Juni, Seite 6604-6
|w (DE-627)NLM098181009
|x 1520-5827
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| 773 |
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|g volume:25
|g year:2009
|g number:12
|g day:16
|g month:06
|g pages:6604-6
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